晶圆减薄工艺后厚度均匀性检测,立仪科技应用案例封面图

Thickness uniformity inspection after wafer thinning process

Uneven thickness after wafer thinning will cause subsequent packaging stress concentration and increase the risk of fragmentation. LightE uses a non-contact thickness measurement solution to conduct multi-point or scanning measurements on thinned wafers to quickly evaluate thickness uniformity and help customers improve the stability of the thinning process.